Control of the Microdomain Orientation in Block Copolymer Thin Films with Homopolymers for Lithographic Application
- 28 April 2007
- journal article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 23 (11) , 6404-6410
Abstract
Block copolymer lithography is a promising method for fabricating periodical nanopatterns of less than 20 nm by self-assembly and can be applicable for fabricating patterned magnetic media with a recording density over 1 Tb/in.2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Simply by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the homopolymer (PS or PMMA) of the major component, we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes the perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.Keywords
This publication has 26 references indexed in Scilit:
- Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” ProcessesMRS Bulletin, 2005
- Electric Field Alignment of Asymmetric Diblock Copolymer Thin FilmsMacromolecules, 2005
- Blends of a 3-Miktoarm Star Terpolymer (3μ-ISD) of Isoprene (I), Styrene (S), and Dimethylsiloxane (D) with PS and PDMS. Effect on Microdomain Morphology and Grain SizeMacromolecules, 2005
- Block Copolymer Monolayer Structure Measured with Scanning Force Microscopy Moiré PatternsMacromolecules, 2005
- A Generalized Approach to the Modification of Solid SurfacesScience, 2005
- Patterning with block copolymer thin filmsMaterials Science and Engineering: R: Reports, 2005
- Macroscopic Orientation of Block Copolymer Cylinders in Single‐Layer Films by ShearingAdvanced Materials, 2004
- Ordered Structures and Phase Transitions in Mixtures of a Polystyrene/Polyisoprene Block Copolymer with the Corresponding Homopolymers in Thin Films and in BulkMacromolecules, 2004
- Fabrication of nanostructures with long-range order using block copolymer lithographyApplied Physics Letters, 2002
- Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square CentimeterScience, 1997