High-energy x-ray response of photographic films: models and measurement
Authors:
- B. L. HenkeBHB. L. Henke
- G. F. StoneGSG. F. Stone
- F. G. FujiwaraFFF. G. Fujiwara
- C. H. DittmoreCDC. H. Dittmore
- J. Y. UejioJUJ. Y. Uejio
- 1 November 1986
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 3 (11) , 1540-1550
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 7 references indexed in Scilit:
- X-ray calibration of Kodak Direct Exposure filmApplied Optics, 1985
- Two-channel, elliptical analyzer spectrograph for absolute, time-resolving time-integrating spectrometry of pulsed x-ray sources in the 100–10 000-eV regionReview of Scientific Instruments, 1985
- Two new X-ray films: conditions for optimum development and calibration of responseJournal of Applied Crystallography, 1985
- Low-energy x-ray response of photographic films I Mathematical modelsJournal of the Optical Society of America B, 1984
- Low-energy x-ray response of photographic films II Experimental characterizationJournal of the Optical Society of America B, 1984
- Pulsed plasma source spectrometry in the 80–8000-eV x-ray regionReview of Scientific Instruments, 1983
- Low-energy x-ray interaction coefficients: Photoabsorption, scattering, and reflectionAtomic Data and Nuclear Data Tables, 1982