Atomistic study of deposition process of Al thin film on Cu substrate
Authors:
- Yongzhi CaoYCYongzhi Cao
- Junjie ZhangJunjie Zhang
- Tao SunTSTao Sun
- Yongda YanYYYongda Yan
- Fuli YuFYFuli Yu
- 1 August 2010
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 256 (20) , 5993-5997
Abstract
No abstract availableKeywords
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