Roll-to-Roll UV Imprint for Bottom-up Transistor Fabrication
Authors:
- P. MauryPMP. Maury
- N. StroeksNSN. Stroeks
- M. WijnenMWM. Wijnen
- R. TackenRTR. Tacken
- R. van der WerfRWR. van der Werf
- 1 January 2011
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 24 (1) , 43-45