High power deposition and analytics of amorphous silicon carbide films
Authors:
- 1 March 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 258 (1-2) , 14-20
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Study of the structure in rf glow discharges in SiH4/H2 by spatiotemporal optical emission spectroscopy: Influence of negative ionsJournal of Applied Physics, 1990
- Spectroscopic study of a D.C. discharge in an argon-silane-nitrogen gas mixture under silicon nitride thin film deposition conditionsPlasma Chemistry and Plasma Processing, 1990
- The mechanism of plasma-induced deposition of amorphous silicon from silanePlasma Chemistry and Plasma Processing, 1990
- Plasma assisted deposition techniques and synthesis of novel materialsThin Solid Films, 1988
- Plasmachemie heterogener SystemeNachrichten aus Chemie, Technik und Laboratorium, 1988
- Amorphous Si and Si-based alloys from glow-discharge plasma1988
- Deposition of TiN and Ti(O,C,N) hard coatings by a plasma assisted chemical vapor deposition processJournal of Vacuum Science & Technology A, 1986
- Plasma polymerization of organosilicon compoundsJournal of Applied Polymer Science, 1985
- Plasma-induced and plasma-assisted chemical vapour depositionThin Solid Films, 1985
- Oligomeric Products in Plasma=Polymerized OrganosiliconesJournal of Macromolecular Science: Part A - Chemistry, 1983