Impact of en-APTAS membrane on the performance of HfO2-based RRAM devices
Authors:
- Myoungsu ChaeMyoungsu Chae
- Ibtisam AhmadIAIbtisam Ahmad
- Yuseong JangYuseong Jang
- Doowon LeeDoowon Lee
- Hee-Dong KimHee-Dong Kim
- 8 April 2025
- journal article
- Published by Elsevier in Surfaces and Interfaces
- Vol. 64
Abstract
No abstract availableFunding Information
- Ministry of Science and ICT, South Korea (RS-2024-00340531)
- National Research Foundation of Korea
- Korea Institute for Advancement of Technology
- Ministry of Trade, Industry and Energy (P0020966)
- Ministry of Education (NRF-2022R1F1A1060655)
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