Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour
Authors:
- Oliver KluthOKOliver Kluth
- Jürgen HüpkesJHJürgen Hüpkes
- Bernd RechBRBernd Rech
Top Cited Papers
- 1 October 2003
- journal article
- conference paper
- Published by Elsevier in Thin Solid Films
- Vol. 442 (1-2) , 80-85
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Development of highly efficient thin film silicon solar cells on texture-etched zinc oxide-coated glass substratesSolar Energy Materials and Solar Cells, 2001
- Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substratesApplied Surface Science, 2001
- Potential of amorphous silicon for solar cellsApplied Physics A, 1999
- Electronic properties of Cu(In,Ga)Se 2 heterojunction solar cells-recent achievements, current understanding, and future challengesApplied Physics A, 1999
- Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cellsThin Solid Films, 1999
- Investigation of Textured Back Reflectors for Microcrystalline Silicon Based Solar CellsMRS Proceedings, 1999
- The physical properties of Al-doped zinc oxide films prepared by RF magnetron sputteringThin Solid Films, 1997
- Texture etched Al-doped ZnO: a new material for enhanced light trapping in thin film solar cells1997
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974