Synthesis and mechanical properties of Ti–Si–C films by a plasma-enhanced chemical vapor deposition
Authors:
- Dae-Suk HanDHDae-Suk Han
- Pung Keun SongPSPung Keun Song
- Kyung-Mox ChoKCKyung-Mox Cho
- Yong Ho ParkYPYong Ho Park
- Kwang Ho KimKKKwang Ho Kim
- 1 November 2004
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 188-189, 446-451
Abstract
No abstract availableKeywords
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