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Publications
Formation of Tough Foundation Layer for Electrical Plating on Insulator using Aerosol Deposition Method of Cu‐Al
2
O
3
Mixed Powder
Home
Publications
Formation of Tough Foundation Layer for Electrical Plating on Insulator using Aerosol Deposition Method of Cu‐Al
2
O
3
Mixed Powder
Formation of Tough Foundation Layer for Electrical Plating on Insulator using Aerosol Deposition Method of Cu‐Al
2
O
3
Mixed Powder
Authors:
NS
Naoki Seto
Naoki Seto
SH
Shingo Hirose
Shingo Hirose
HT
Hiroki Tsuda
Hiroki Tsuda
JA
Jun Akedo
Jun Akedo
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31 January 2014
book chapter
Published by
Wiley
p.
17-22
DOI:
10.1002/9781118771402.ch2
Abstract
No abstract available
Keywords
COPPER
AEROSOL DEPOSITION
ELECTRICAL PLATING
PLATING THICKNESS
POWER ELECTRIC CIRCUITS
Cited
Cited by 2 articles
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