Depth profiling of surface oxidized TiAlN film by synchrotron radiation excited X-ray photoelectron spectroscopy
Authors:
- F. EsakaFEF. Esaka
- K. FuruyaKFK. Furuya
- H. ShimadaHSH. Shimada
- M. ImamuraMIM. Imamura
- N. MatsubayashiNMN. Matsubayashi
- T. SatoTST. Sato
- A. NishijimaANA. Nishijima
- T. KikuchiTKT. Kikuchi
- A. KawanaAKA. Kawana
- H. IchimuraHIH. Ichimura
- 1 April 1997
- journal article
- Published by Elsevier in Surface Science
- Vol. 377-379, 197-200
Abstract
No abstract availableKeywords
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