In situx-ray reflectivity studies on the formation of substrate-supported phospholipid bilayers and monolayers

We conducted time-dependent, in situ x-ray reflectivity measurements on the formation of substrate-supported lipid monolayers and bilayers at solid-liquid interfaces, buried under an aqueous buffer with various concentrations (5, 10, 20, 40, and $50\mu \text{g}/\text{ml}$) of lipid 1,2-dioleoyl-sn-glycero-3-phosphocholine (DOPC). The DOPC bilayer is formed on the hydrophilic surface of a bare Si substrate, while the DOPC monolayer is formed on a hydrophobic octadecylthricholorsilane (OTS) monolayer-coated Si substrate. The evolution of the reflectivity curves from the lipid bilayers is well described by lateral growth of bilayer islands, consistent with the rupture and fusion model for the adsorption of lipid vesicles to solid-liquid interfaces. By contrast, the formation of the lipid monolayer on OTS-coated Si occurs through a relatively fast coverage of the entire interfacial area, followed by an increase in the monolayer thickness. For both monolayers and bilayers, the rate of lipid layer growth increases with increasing lipid concentration in the buffer solution.