Effect of temperature on the initial, thermal oxidation of zirconium
Authors:
- A. LyapinALA. Lyapin
- L.P.H. JeurgensL.P.H. Jeurgens
- E.J. MittemeijerEME.J. Mittemeijer
- 1 June 2005
- journal article
- Published by Elsevier in Acta Materialia
- Vol. 53 (10) , 2925-2935
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- The initial, thermal oxidation of zirconium at room temperatureJournal of Applied Physics, 2004
- Quantitative analysis of the X-ray photoelectron spectra of zirconium and zirconium oxideSurface Science, 2004
- Growth kinetics and mechanisms of aluminum-oxide films formed by thermal oxidation of aluminumJournal of Applied Physics, 2002
- Composition and chemical state of the ions of aluminium-oxide films formed by thermal oxidation of aluminiumSurface Science, 2002
- The dissolution of oxide on α-Zr(1%Nb) and β-Zr(20%Nb) alloysJournal of Nuclear Materials, 2002
- Structure and electrical levels of point defects in monoclinic zirconiaPhysical Review B, 2001
- Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor applicationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2001
- Elemental binding energies for X-ray photoelectron spectroscopyApplied Surface Science, 1995
- An x-ray photoelectron spectroscopy investigation of the incorporation of surface oxides into bulk zirconiumJournal of Vacuum Science & Technology A, 1987
- The oxidation of metalsReports on Progress in Physics, 1974