Improving stamps for 10 nm level wafer scale nanoimprint lithography
Authors:
- M. BeckMBM. Beck
- M. GraczykMGM. Graczyk
- I. MaximovIMI. Maximov
- E.-L. SarweESE.-L. Sarwe
- T.G.I. LingTLT.G.I. Ling
- M. KeilMKM. Keil
- L. MonteliusLML. Montelius
- 1 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 441-448
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Nanoimprint lithography at the 6 in. wafer scaleJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1997
- Properties of thin anti-adhesive films used for the replication of microstructures in polymersMicroelectronic Engineering, 1997