Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor deposition
Authors:
- C.H. LinCLC.H. Lin
- H.L. WangHWH.L. Wang
- M.H. HonMHM.H. Hon
- 1 March 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 90 (1-2) , 102-106
Abstract
No abstract availableKeywords
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