The effect of pulsed laser annealing on the nickel silicide formation
Authors:
- Hou-Yu ChenHCHou-Yu Chen
- Chia-Yi LinCLChia-Yi Lin
- Chien-Chao HuangCHChien-Chao Huang
- Chao-Hsin ChienCCChao-Hsin Chien
- 1 December 2010
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 87 (12) , 2540-2543
Abstract
No abstract availableKeywords
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