Quantitative ARXPS investigation of systems with ultrathin aluminium oxide layers

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Abstract
Angle‐resolved x‐ray photoelectron spectroscopy (ARXPS) is a non‐destructive method to investigate the near‐surface structure of specimens with a flat surface. For interpretation of the electron intensities emitted from different depth regions, model calculations are necessary. Based on an earlier algorithm we have developed a program for ARXPS studies of thin multilayers. In our model calculation the sample structure is treated as consisting of several layers (one to three) on the substrate, whereas the top layer can be incomplete. Emitted electrons are assumed to be attenuated exponentially in the layers. Different atomic volumes, electron attenuation lengths (including consideration of elastic scattering) and assumptions on stoichiometry are taken into account for the particular layers. As an application of our model calculations we present a study of a set of Al samples that were oxidized by different methods, i.e. natural and plasma oxidation (plasma obtained by electron cyclotron resonance). The oxide layers produced by plasma oxidation were protected by a 2 nm thick Co film, before exposing the samples to the air. Additionally, in order to check our results of the ARXPS model calculation, x‐ray reflectometry (XRR) analysis was used. Copyright © 2004 John Wiley & Sons, Ltd.
Funding Information
  • Deutsche Forschungsgemeinschaft (WE 1519/10.)
  • Saxony Ministry SMWA (6917/1083.)

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