Intrinsic defects and their influence on the chemical and optical properties of TiO2−x films
Authors:
- N LaidaniNLN Laidani
- P CheyssacPCP Cheyssac
- J PerrièreJPJ Perrière
- R BartaliRBR Bartali
- G GottardiG Gottardi
- I LuciuILI Luciu
- V MicheliVMV Micheli
- 18 November 2010
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 43 (48)
Abstract
In this work, TiO2 films produced by rf sputtering of a TiO2 target in argon and argon–oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range 3–20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry, x-ray photoelectron spectroscopy (XPS) and x-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.Keywords
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