Theoretical and practical aspects of collimated sputtering
Author:
- 15 October 1994
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 76 (8) , 4857-4862
Abstract
Aspects and implications of collimated sputtering have been studied through experiments and simulations. Dependences and scaling relationships of via bottom coverage, deposition efficiency, thickness and coverage uniformity, and collimator lifetime have been examined. Geometrically, collimator effectiveness, transmission efficiency, and target erosion-related nonuniformity scale principally with collimator cell aspect ratio. Ripple variations in thickness and coverage depend not only on aspect ratio, but also on the ratio of cell depth to the collimator-substrate distance. Collimator lifetime depends on cell size, aspect ratio, and on the positions of the collimator and substrate in front of the target. Such geometrical factors are complicated by scattering by the sputter gas which scales according to the product of pressure and the appropriate distance.Keywords
This publication has 5 references indexed in Scilit:
- Properties of titanium and aluminum thin films deposited by collimated sputteringThin Solid Films, 1993
- Experimental study and computer simulation of collimated sputtering of titanium thin films over topographical featuresJournal of Applied Physics, 1993
- Spatial and angular nonuniformities from collimated sputteringJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1993
- Modeling bias sputter planarization of metal films using a ballistic deposition simulationJournal of Vacuum Science & Technology A, 1991
- Collimated magnetron sputter depositionJournal of Vacuum Science & Technology A, 1991