CO-sensing properties of hafnium oxide thin films prepared by electron beam evaporation
Author:
- 10 January 2007
- journal article
- Published by Elsevier in Sensors and Actuators B: Chemical
- Vol. 120 (2) , 700-705
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Physicochemical properties of HfO2 in response to rapid thermal annealApplied Physics Letters, 2003
- Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer depositionJournal of Applied Physics, 2003
- Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistanceThin Solid Films, 1999
- Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion sourceThin Solid Films, 1999
- Physical characterization of hafnium oxide thin films and their application as gas sensing devicesJournal of Vacuum Science & Technology A, 1998
- Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxyThin Solid Films, 1994
- Optical properties and environmental stability of oxide coatings deposited by reactive sputteringApplied Optics, 1993
- Reactive evaporation of low-defect density hafniaApplied Optics, 1993
- Optical and microstructural properties of hafnium dioxide thin filmsThin Solid Films, 1991
- Chemical vapor deposition and characterization of HfO2 films from organo-hafnium compoundsThin Solid Films, 1977