Low-Temperature Growth of ZnO Thin Films by Linear Source Ultrasonic Spray Chemical Vapor Deposition

This publication has 23 references indexed in Scilit:

• Linear-Source Ultrasonic Spray Chemical Vapor Deposition Method for Fabrication of ZnMgO Films and Ultraviolet Photodetectors
  Japanese Journal of Applied Physics, 2006
• Chemical-Bath-Deposited ZnO and Mg(OH)₂ Buffer Layer for Cu(InGa)Se₂ Solar Cells
  Japanese Journal of Applied Physics, 2006
• Fabrication and Properties of ZnO Thin Films Prepared by Fine Channel Mist Method
  Journal of the Society of Materials Science, Japan, 2006
• Gas-jet electron beam plasma chemical vapor deposition method for solar cell application
  Solar Energy Materials and Solar Cells, 2005
• The effect of humidity on thermal process of zinc acetate
  Thermochimica Acta, 2003
• Preparation of ZnO Thin Films Deposited by Plasma Chemical Vapor Deposition for Application to Ultraviolet-cut Coating
  Japanese Journal of Applied Physics, 2001
• Production of transparent conductive films with inserted SiO₂anchor layer, and application to a resistive touch panel
  Electronics and Communications in Japan (Part II: Electronics), 2001
• Electrical, optical and annealing characteristics of ZnO:Al films prepared by spray pyrolysis
  Thin Solid Films, 1991
• Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysis
  Thin Solid Films, 1983
• Thin layers deposited by the pyrosol process
  Thin Solid Films, 1981