Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride
- 10 July 2017
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 29 (14) , 6022-6029
Abstract
No abstract availableKeywords
Funding Information
- Division of Chemistry (CHE-1300180)
- Versum Materials Inc.
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