X-ray diffraction studies of physically vapour-deposited coatings
Authors:
- D.S. RickerbyDRD.S. Rickerby
- A.M. JonesAJA.M. Jones
- B.A. BellamyBBB.A. Bellamy
- 1 February 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 37 (1) , 111-137
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Correlation of process and system parameters with structure and properties of physically vapour- deposited hard coatingsThin Solid Films, 1988
- Residual stress measurement of refractory coatings as a nondestructive evaluationJournal of Materials for Energy Systems, 1985
- The stress in ion-plated HfN and TiN coatingsThin Solid Films, 1985
- Hafnium nitride coatings prepared by very high rate reactive sputteringThin Solid Films, 1984
- Residual stress in coated low-z films of TiC and TiN: II. correlation of residual stress with microstructureJournal of Nuclear Materials, 1984
- Residual stress in coated low-Z films oF TiC and TiN: I. Stress measurement by use of X-ray diffractometryJournal of Nuclear Materials, 1984
- Influence of substrate bias on composition and structure of reactively r.f.-sputtered TiC filmsThin Solid Films, 1981
- Lattice parameter of the non-stoichiometric compound TiNxJournal of Applied Crystallography, 1975
- Structural Investigation of Thin FilmsJournal of Vacuum Science and Technology, 1970
- A Correction for the 1 2Doublet in the Measurement of Widths of X-ray Diffraction LinesJournal of Scientific Instruments, 1948