Multibenzyl Chloride Based Molecular Resists Enabling 13 nm Half-Pitch Lithography via Self-Cross-Linking
- 22 October 2025
- journal article
- Published by American Chemical Society (ACS) in ACS Applied Polymer Materials
- Vol. 7 (21) , 14338-14347
Abstract
No abstract availableAll Related Versions
Funding Information
- National Natural Science Foundation of China (22090012, 22475224)
- Chinese Academy of Sciences
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