The formation of O and H radicals in a pulsed discharge in atmospheric pressure helium with water vapour admixtures
Open Access
- 1 June 2023
- journal article
- research article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 32 (6) , 065004
Abstract
The spatio-temporal distribution of O and H radicals in a 90 ns pulsed discharge, generated in a pin–pin geometry with a 2.2 mm gap, in He + H2O (0.1% and 0.25%), is studied both experimentally and by 1D fluid modelling. The density of O and H radicals as well as the effective lifetimes of their excited states are measured using picosecond resolution two-photon absorption laser induced fluorescence. Good agreement between experiments and modelling is obtained for the species densities. The density of O and H is found to be homogenous along the discharge axis. Even though the high voltage pulse is 90 ns long, the density of O peaks only about 1 μs after the end of the current pulse, reaching 2 × 1016 cm−3 at 0.1% H2O. It then remains nearly constant over 10 μs before decaying. Modelling indicates that the electron temperature (Te) in the centre of the vessel geometry ranges from 6 to 4 eV during the peak of discharge current, and after 90 ns, drops below 0.5 eV in about 50 ns. Consequently, during the discharge (2 by electron impact, and in the early afterglow (from 100 ns to 1 μs) O is produced by dissociative recombination of O2 +. The main loss mechanism of O is initially electron impact ionisation and once T e has dropped, it becomes mainly Penning ionisation with He2* and He* as well as three-body recombination with O+ and He. On time scales of 100–200 μs, O is mainly lost by radial diffusion. The production of H shows a similar behaviour, reaching 0.45 × 1016 cm−3 at 1 μs, due to direct dissociation of H2O by electron impact (2* and by electron impact ionisation, and by charge exchange with O+. Increasing concentrations of water vapour, from 0.1% to 0.25%, have little effect on the nature of the processes of H formation but trigger a stronger initial production of O, which is not currently reproduced satisfactorily by the modelling. What emerges from this study is that the built up of O and H densities in pulsed discharges continues after electron-impact dissociation processes with additional afterglow processes, not least through the dissociative recombination of O2 + and H2 +.Keywords
Funding Information
- Engineering and Physical Science Research Council (EP/S025790/1)
This publication has 60 references indexed in Scilit:
- Atomic oxygen TALIF measurements in an atmospheric-pressure microwave plasma jet within situxenon calibrationPlasma Sources Science and Technology, 2013
- Modelling of OH production in cold atmospheric-pressure He–H2O plasma jetsPlasma Sources Science and Technology, 2013
- Energy efficiency in nanoscale synthesis using nanosecond plasmasScientific Reports, 2013
- Self-consistent two-dimensional modeling of cold atmospheric-pressure plasma jets/bulletsPlasma Sources Science and Technology, 2012
- Generation and loss of reactive oxygen species in low-temperature atmospheric-pressure RF He + O2 + H2O plasmasJournal of Physics D: Applied Physics, 2012
- Nanoparticle‐Based Electrochemical Immunosensor for the Detection of Phosphorylated Acetylcholinesterase: An Exposure Biomarker of Organophosphate Pesticides and Nerve AgentsChemistry – A European Journal, 2008
- Primary chemical reactions in pulsed electrical discharge channels in waterJournal of Physics D: Applied Physics, 2007
- Laser-induced fluorescence measurements of absolute atomic densities: concepts and limitationsPlasma Sources Science and Technology, 2005
- Boundary conditions in fluid models of gas dischargesPhysical Review E, 2000
- Radiative lifetimes and two-body collisional deactivation rate constants in Ar for Xe(5p56p),Xe(5p56p), and Xe(5p57p) statesThe Journal of Chemical Physics, 1981