Positive-type Photosensitive Polyimide with Low Modulus based on Soluble Block Copoly(imide-siloxane)
Authors:
- Xing Zhou JinXJXing Zhou Jin
- Hiroyuki IshiiHIHiroyuki Ishii
- 1 January 2004
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 17 (2) , 201-206
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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