Effect of Process Parameters on TSV Formation Using Deep Reactive Ion Etching
Authors:
- Kwang-Seok KimKKKwang-Seok Kim
- Young-Chul LeeYLYoung-Chul Lee
- Jee-Hyuk AhnJAJee-Hyuk Ahn
- Jun Yeob SongJSJun Yeob Song
- Choong D. YooCYChoong D. Yoo
- Seung-Boo JungSJSeung-Boo Jung
- 25 November 2010
- journal article
- Published by The Korean Institute of Metals and Materials in Korean Journal of Metals and Materials
- Vol. 48 (11) , 1028-1034