In situ Fourier transform P-polarized infrared reflection absorption spectroscopic investigation of an interface properties of SiO2/Si(100) deposited using electron cyclotron resonance microwave plasma at room temperature
Authors:
- 13 June 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 370 (1-2) , 199-202
Abstract
No abstract availableKeywords
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