Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits
Authors:
- Sun-Tae JungSJSun-Tae Jung
- Hyung-Seung SongHSHyung-Seung Song
- Dong-Su KimDKDong-Su Kim
- Hyoun-Soo KimHKHyoun-Soo Kim
- 1 March 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 341 (1-2) , 188-191
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Selective dry etching of oxide films for spacer applications in a high density plasmaJournal of Vacuum Science & Technology B, 1996
- Side Wall Roughness Reduction in Deep Silicon Oxide Etching Using C2F6 Based ECR-RIBEJapanese Journal of Applied Physics, 1995
- Silica waveguides on silicon and their application to integrated-optic componentsOptical and Quantum Electronics, 1990
- Silica-Based Single-Mode Waveguides and Their Applications to Integrated-Optic DevicesMRS Proceedings, 1989
- Flame Hydrolysis Deposition of SiO2-TiO2, Glass Planar Optical Waveguides on SiliconJapanese Journal of Applied Physics, 1983
- Fabrication of SiO 2 -TiO 2 glass planar optical waveguides by flame hydrolysis depositionElectronics Letters, 1983