The effects of oxygen concentration in sputter-deposited molybdenum films
Authors:
- T.T. BardinTBT.T. Bardin
- J.G. PronkozJPJ.G. Pronkoz
- R.C. BudhaniRBR.C. Budhani
- J.S. LinJLJ.S. Lin
- R.F. BunshahRBR.F. Bunshah
- 1 November 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 165 (1) , 243-247
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Effects of substrate bias on the resistivity and microstructure of molybdenum and molybdenum silicide filmsThin Solid Films, 1987
- Influence of Surface Absorption Characteristics on Reactively Sputtered Films Grown in the Biased and Unbiased ModesJournal of Applied Physics, 1972
- Elastic Scattering of Alpha-Particles by OxygenPhysical Review B, 1953