Stress Adjustment in Si3N4 Films by Ion Implantation
Authors:
- 1 January 1975
- book chapter
- Published by Springer Nature
- p. 673-680
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Compaction of ion-implanted fused silicaJournal of Applied Physics, 1974
- X-Ray Determination of Stresses in Thin Films and Substrates by Automatic Bragg Angle ControlReview of Scientific Instruments, 1973
- Silicon Nitride Thin Films from SiCl[sub 4] Plus NH[sub 3]: Preparation and PropertiesJournal of the Electrochemical Society, 1968
- Thermal Expansion Coefficient of a Pyrolitically Deposited Silicon Nitride FilmJapanese Journal of Applied Physics, 1967
- Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] SystemJournal of the Electrochemical Society, 1967