Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors
- 8 January 2015
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 27 (2) , 604-611
Abstract
No abstract availableKeywords
Funding Information
- Finnish Centre of Excellence in Atomic Layer Deposition, University of Helsinki
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