In situ FTIR investigation of the electrochemical microstructuring of n-Si(111)
Authors:
- J. RappichJRJ. Rappich
- H.J. LewerenzHLH.J. Lewerenz
- 1 April 1996
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 41 (5) , 675-680
Abstract
No abstract availableThis publication has 34 references indexed in Scilit:
- Electrochemically prepared Si(111) 1×1-H surfaceApplied Physics Letters, 1993
- Electrolytic Hydrogenation of Silicon: A High Resolution Electron Energy Loss Spectroscopy InvestigationJournal of the Electrochemical Society, 1993
- Porous silicon formation mechanismsJournal of Applied Physics, 1992
- Anodic oxides on siliconElectrochimica Acta, 1992
- Electrochemical and optical studies of silicon dissolution in ammonium fluoride solutionsElectrochimica Acta, 1992
- Electrolytic Hydrogenation of SiliconJournal of the Electrochemical Society, 1992
- Porous silicon formation: A quantum wire effectApplied Physics Letters, 1991
- In SituCharacterization of the Illuminated Silicon-Electrolyte Interface by Fourier-Transform Infrared SpectroscopyPhysical Review Letters, 1989
- Hydrogen Vibration on Si(111) 7 × 7: Evidence for a Unique Chemisorption SitePhysical Review Letters, 1983
- Formation and Properties of Porous Silicon FilmJournal of the Electrochemical Society, 1977