The Unusual Thermal Stabilization of MOCVD Precursors by the Dibenzoyl Methanate Group: Liquid Injection MOCVD of Tantalum Oxide and Niobium Oxide Using M(OEt)4(dbm) Precursors
Authors:
- A. C. JonesAJA. C. Jones
- P. J. WrightP. J. Wright
- A. SteinerA. Steiner
- 3 May 2002
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 8 (3) , 110-116