Investigate the Reacting Flux of Chemical Bath Deposition by a Continuous Flow Microreactor
Authors:
- 1 January 2009
- journal article
- Published by The Electrochemical Society in Electrochemical and Solid-State Letters
- Vol. 12 (7) , H244-H247
Abstract
Chemical bath deposition (CBD) is a commonly used and inexpensive technique to deposit a variety of semiconductor and oxide thin films for a variety of different applications. In this work, a continuous flow microreactor was used to better control the reacting flux present during the CBD reaction by offering a better temporal resolution. High quality CdS films at various thicknesses could be obtained by using a flux that avoided the formation of nanoparticles. The chemistry and growth kinetics of CdS CBD were elucidated using this microreactor. The results suggest that ions formed during the thiourea hydrolysis reaction are the dominant sulfide ion source responsible for the CdS deposition.Keywords
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