Electron-beam writing system and its application to large and high-density diffractive optic elements
Authors:
- Shiro OgataSOShiro Ogata
- Masami TadaMTMasami Tada
- Masahiro YonedaMYMasahiro Yoneda
- 1 April 1994
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 33 (10) , 2032-2038
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 6 references indexed in Scilit:
- Laser beam lithographed micro-Fresnel lensesApplied Optics, 1990
- Low-wavefront aberration and high-temperature stability molded micro Fresnel lensIEEE Photonics Technology Letters, 1989
- Microcollimated laser diode with low wavefront aberrationIEEE Photonics Technology Letters, 1989
- Computer-controlled electron-beam writing system for thin film micro-opticsJournal of Vacuum Science & Technology B, 1987
- High speed flat guide ceramic stage for electron-beam lithography systemJournal of Vacuum Science & Technology B, 1986
- Blazed gratings and Fresnel lenses fabricated by electron-beam lithographyOptics Letters, 1982