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Photoresist materials: a historical perspective
Home
Publications
Photoresist materials: a historical perspective
Photoresist materials: a historical perspective
Authors:
CW
C. Grant Willson
C. Grant Willson
RD
Ralph R. Dammel
Ralph R. Dammel
AR
Arnost Reiser
Arnost Reiser
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7 July 1997
conference paper
Published by
SPIE-Intl Soc Optical Eng
Vol. 3049
,
28-42
DOI:
10.1117/12.275826
Abstract
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials.
Keywords
PHOTOGRAPHY
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