Nanoindentation creep of plasma-enhanced chemical vapor deposited silicon oxide thin films
Authors:
- Zhiqiang CaoZCZhiqiang Cao
- Xin ZhangXZXin Zhang
- 1 February 2007
- journal article
- Published by Elsevier in Scripta Materialia
- Vol. 56 (3) , 249-252
Abstract
No abstract availableKeywords
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