Etching characteristic of ZnO thin films in an inductively coupled plasma
Authors:
- J.C. WooJWJ.C. Woo
- G.H. KimGKG.H. Kim
- J.G. KimJKJ.G. Kim
- C.I. KimCKC.I. Kim
- 1 August 2008
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 202 (22-23) , 5705-5708
Abstract
No abstract availableKeywords
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