A comparison of Ge, Sb and Te thermal diffusion through Ge2Sb2Te5
Authors:
- Minh Anh LuongMinh Anh Luong
- Sijia RanSRSijia Ran
- Chiara SabbioneCSChiara Sabbione
- Alain ClaverieACAlain Claverie
- 2 June 2023
- journal article
- research article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 164
Abstract
No abstract availableKeywords
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