P implantation doping of Ge: Diffusion, activation, and recrystallization
Authors:
- 1 January 2006
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Vol. 24 (1) , 494-498
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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