Plasma properties and stoichiometry of laser-deposited BiSrCaCuO thin films
- 1 February 1995
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 86 (1-4) , 40-44
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Real time emission spectroscopy during laser ablation of BiSrCaCuO targetsThin Solid Films, 1994
- Incongruent transfer in laser deposition of FeSiGaRu thin filmsJournal of Applied Physics, 1993
- Gas-phase oxidation of copper during laser ablation of YBa2Cu3O7−δ in different oxidizing ambientsApplied Physics Letters, 1993
- Effect of different oxidizing gases on the in-situ growth of YBa2Cu3O7−δ films by pulsed laser depositionPhysica C: Superconductivity and its Applications, 1992
- Effect of oxygen pressure on properties of BiSrCaCuO thin films grown by laser depositionPhysica C: Superconductivity and its Applications, 1992
- Analysis of the plasma expansion dynamics by optical time-of-flight measurementsApplied Surface Science, 1992
- Study of laser ablation of BiSrCaCuOApplied Surface Science, 1992
- Time-resolved emission spectra following the 193-nm photoablation of CuO, BaO2, Y2O3, and YBa2Cu3O7−x in vacuum and oxygenJournal of Applied Physics, 1991
- Characterization of the KrF laser-induced plasma plume created above a BiSrCaCuO targetApplied Physics Letters, 1990
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985