In-situ investigation of the early stage of the growth of a-Si : H on silica and tin dioxide substrates
Authors:
- A.M. AntoineAAA.M. Antoine
- B. DrevillonBDB. Drevillon
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 1403-1406
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- I n s i t u investigation of the growth of rf glow-discharge deposited amorphous germanium and silicon filmsJournal of Applied Physics, 1987
- Effect of deposition conditions on the nucleation and growth of glow-discharge a-Si:HJournal of Applied Physics, 1987
- Fast polarization modulated ellipsometer using a microprocessor system for digital Fourier analysisReview of Scientific Instruments, 1982