High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
Authors:
- H. LorenzHLH. Lorenz
- M. DespontMDM. Despont
- N. FahrniNFN. Fahrni
- J. BruggerJBJ. Brugger
- P. VettigerPVP. Vettiger
- P. RenaudPRP. Renaud
- 1 January 1998
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 64 (1) , 33-39
Abstract
No abstract availableKeywords
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- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986