Interface smoothing in short-period W/B4C multilayers using neon ion beam polishing

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Abstract
Short-period 2.5 nm W/B4C multilayers are useful as dispersive Bragg reflectors in wavelength-dispersive x-ray fluorescence. However, high roughness at the W–B4C interfaces deteriorates optical performance. To improve this, low-energy neon ion beam polishing (IBP) has been applied in sputter-deposited 2.5 nm W/B4C multilayers. Two energies, 200 and 50 eV, were investigated to study the effects of polishing by sputter removal (200 eV) and polishing by the mobilization of weakly bound surface atoms (50 eV). Atomic force microscopy and x-ray scattering showed reduced interface roughness for both IBP energies. However, the optical constant profile of 200 eV IBP showed strong W–B4C intermixing and interface asymmetry, leading to significant reflectance loss. In contrast, 50 eV IBP resulted in sharp, symmetric interfaces and increased optical contrast. A 43% peak reflectance at θ = ⁓9.7° grazing for W/B4C with 50 eV IBP was measured at λ = 0.834 nm—a 6.4% increase relative to non-polished W/B4C, corresponding to a 25% increase in integrated reflectance. These results highlight the necessity of using low-energy ion polishing by the mobilization of weakly bound surface atoms in short-period multilayers—rather than polishing by sputter removal.
Funding Information
  • ASML (741.018.301)
  • Carl Zeiss SMT (741.018.301)
  • Malvern Panalytical (741.018.301)

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