Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
Authors:
- W P LeroyWLW P Leroy
- S KonstantinidisSKS Konstantinidis
- S MahieuSMS Mahieu
- R SnydersRSR Snyders
- D DeplaDDD Depla
- 1 March 2011
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 44 (11)
Abstract
A rotating cylindrical magnetron equipped with a titanium target was sputtered in dc and in HIPIMS mode, both in metallic and in the oxide regime. For all sputter modes, the same process conditions and the same average sputtering power of 300 W were used. An angular-resolved study was performed, 90° around the rotating cylindrical magnetron, which obtained the total energy flux arriving at the substrate. Furthermore, the energy flux per adparticle was calculated by measuring the deposition rate for all sputter modes and regimes. There is only a small difference in total arriving energy flux between the dc mode and the HIPIMS mode. A maximum arriving energy flux of ca 0.26 mW cm−2 was measured, when normalized to the sputtering power. Concerning the deposition rate, up to a 75% decrease was found from dc to HIPIMS mode. Furthermore, the emission and the transport of the particles have a similar angular profile for all sputter modes. Among the HIPIMS modes, a decrease in deposition rate was measured with increasing pulse length. Therefore, the energy which arrives per adparticle is the highest for the HIPIMS modes. A difference in the angular shape of the energy per arriving adparticle is noticed between the dc and the HIPIMS modes. The dc mode has a maximum arriving energy per adparticle at around 50°, while this is at 60° for the HIPIMS mode.Keywords
This publication has 34 references indexed in Scilit:
- Rotating cylindrical magnetron sputtering: Simulation of the reactive processJournal of Applied Physics, 2010
- High power pulsed magnetron sputtering: A review on scientific and engineering state of the artSurface and Coatings Technology, 2010
- High power impulse magnetron sputtering using a rotating cylindrical magnetronJournal of Vacuum Science & Technology A, 2009
- Noble gas retention in the target during rotating cylindrical magnetron sputteringApplied Physics Letters, 2008
- Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technologyVacuum, 2008
- Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputteringJournal of Physics D: Applied Physics, 2008
- Ionized physical vapor deposition (IPVD): A review of technology and applicationsThin Solid Films, 2006
- A novel pulsed magnetron sputter technique utilizing very high target power densitiesSurface and Coatings Technology, 1999
- Advances in magnetron sputter sourcesThin Solid Films, 1999
- Design advances and applications of the rotatable cylindrical magnetronJournal of Vacuum Science & Technology A, 1986