Degradation during ARXPS measurements of polystyrene treated with an oxygen plasma

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Abstract
Thin polystyrene films, deposited on glass substrates, were exposed to an oxygen / helium plasma for 3s, 7s, 15s or 30s. Following exposure to air for four weeks, the samples were analyzed by ARXPS in a VG ESCALAB 220i X‐ray photoelectron spectrometer and in a VG Theta Probe instrument. Comparison of the results obtained demonstrates the effect of the oxygen loss during analysis in the VG ESCALAB 220i, which flattens the angle‐resolved profiles obtained and leads to the calculation of an oxygen depth profile which extends deeper into the surface and in which the oxygen concentration is lower. A simple procedure for the correction of the data obtained in the VG ESCALAB 220i is only partially successful at reconciling the derived oxygen depth profile with that calculated from the Theta Probe data. Copyright © 2002 John Wiley & Sons, Ltd.

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