Investigation of plasma parameters in an active screen cage-pulsed dc plasma used for plasma nitriding

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Abstract
Active screen cage-pulsed dc plasmas are widely used in the material processing applications such as plasma nitriding, carburizing and nitrocarburizing. Specifically for plasma nitriding applications, a H2–N2 mixture is used. In this article, a study of the electron number density (ne), atomic nitrogen density ([N]), electron temperature and the excitation temperature is reported in the presence of an active screen cage-pulsed dc plasma. The ne and are determined here by a triple Langmuir probe, while [N] and are estimated by optical emission spectroscopy (OES). The two temperatures and their ratio are compared for different input parameters (such as applied power, gas pressure and H2 percentage). This study is useful in active screen cage plasma nitriding applications where only few plasma diagnostic measurements have been reported.

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