Low energy ECR plasma etching with a hybrid magnetic field

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30 April 1990

journal article
Published by Elsevier in Microelectronic Engineering

Vol. 11 (1-4) , 587-590
DOI:10.1016/0167-9317(90)90176-t

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This publication has 1 reference indexed in Scilit:

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source
Japanese Journal of Applied Physics, 1982