Nanometerscale lithography with chromium atoms using light forces
Authors:
- U. DrodofskyUDU. Drodofsky
- J. StuhlerJSJ. Stuhler
- B. BrezgerBBB. Brezger
- Th. SchulzeTSTh. Schulze
- M. DrewsenMDM. Drewsen
- T. PfauTPT. Pfau
- J. MlynekJMJ. Mlynek
- 1 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 285-288
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Imaging and focusing of an atomic beam with a large period standing light waveApplied Physics B, 1992