Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions
Authors:
- Harold PhilipsenHPHarold Philipsen
- Nils MouwenNMNils Mouwen
- Sander TeckSTSander Teck
- Wouter MonnensWMWouter Monnens
- Quoc Toan LeQLQuoc Toan Le
- Frank HolsteynsFHFrank Holsteyns
- Herbert StruyfHSHerbert Struyf
- 1 May 2019
- journal article
- research article
- Published by Elsevier in Electrochimica Acta
- Vol. 306, 285-298
Abstract
No abstract availableKeywords
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